Silicon nitride makes strides toward orthopedics

Pattern Photoresist Silicon Silicon Nitride Silicon Photoresist Silicon Nitride Silicon Etch Nitride Remove Photoresist

In this proposal we seek to establish a porous silicon based etching process in the WTC microfabrication laboratory. The new process will allow us to etch high aspect ratio holes through a wafer. Holes like these are important for decreasing the dead volume of connections between micro and macro systems and for increasing the complexity of micro-fluidic systems. At the present time, the minimum...

Silicon Nitride and Silicon Carbide

Making strides toward active living: the policy research perspective.

Physical activity has been promoted to improve health for decades. A summary of the health benefits and physical activity recommendations gained national support in the 1996 landmark publication of the Surgeon General’s Report on Physical Activity and Health. Specific physical activity recommendations have evolved from vigorous exercise for cardiovascular fitness to an accumulation of moderatel...

Plasma Deposition of Silicon Nitride

This paper reports on the preparation and characterization of thin films of silicon nitride deposited on heated silicon substrates from Si(CH, ),-NHS-H, mixtures activated at room temperature by an a-c. discharge at low frequency. The films were deposited at 800°C. Deposition rate as well as refractive index were measured and several parameters were systematically varied , including deposition ...

Photo-processing of silicon nitride

Silicon nitride films were synthesized using the new process of photo-chemical vapour deposition (photo-CVD). Films of different compositions were prepared by mercury-sensitized photo-CVD using 2% silane and ammonia as reactant gases. Material properties of interest to device technology have been evaluated. Dependence of the properties of the films on the Si/N ratio and the amount of hydrogen p...